IBM unveil performance boosting chip technology
by David Masters
April 15, 2008
IBM have unveiled a new technology that boosts the performance of microprocessor chips whilst at the same time reducing power consumption.
The technology involves manufacturing the transistors in the chips using a new material called high-k/metal gate.
This makes for the smallest ever transistors, at just 32 nanometres, whilst giving up to 30% better performance and 50% less power consumption.
These performance figures are compared to the current 45 nanometre chips operating at a similar voltage.
The reduced size also means that that microprocessor manufacturers are able to get more devices onto a piece of silicon, resulting in further gains in power efficiency.
IBM says that prototype models of the chips will be available from the third quarter of this year. High volume production of the chips will start towards the end of 2009.
High-k/metal gate is made using the chemical element hafnium. Using this chemical means that chip manufacturers will be able to continue using the same production processes, resulting in lower costs.
The processor chips will be used in devices ranging from mobile phones and PDAs to high powered gaming machines and commercial servers.
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